Frost & Sullivan releases the 'China PCB Photoresist Dry Film Industry Independent Market research report'

Photolithography resist is a carrier medium used in lithography. It can utilize photochemical reactions to transfer fine patterns from the mask onto the substrate to be processed through photolithography processes such as exposure, development, and etching. According to different application fields, photolithography resists can be mainly divided into PCB (Printed Circuit Board) resist, display panel resist, and semiconductor resist. Among them, PCB resist mainly includes photosensitive dry film, wet film resist, and solder mask ink. Photosensitive dry film and wet film resist work similarly, both using their unique exposure reactions and anti-etching properties to transfer the designed circuit image onto the PCB substrate through processes such as exposure, development, etching, and cleaning. Solder mask ink is used after copper traces are formed and coated on the surface of the PCB to form an insulating protective layer. Frost & Sullivan has long been monitoring the Chinese PCB photosensitive dry film industry and has specifically released the 'Independent Market Research Report on the Chinese PCB Photosensitive Dry Film Industry'.